2026-09-08 06:54:22
ASML Plans Next-Generation EUV Lithography Systems With Larger Masks by 2031, Targeting Production in 2033
According to ChainCatcher, ASML plans to develop next-generation EUV lithography systems with larger mask sizes by 2031, targeting full-scale production deployment in 2033. The company aims to address capacity constraints of its current high-numerical-aperture EUV systems, which are limited by